镧系元素掺杂二氧化铪和超薄二氧化铪的总剂量效应研究

11375146
2013
A3004.核分析技术及应用
赵策洲
面上项目
教授
西交利物浦大学
81万元
辐射诱发的漏电流和击穿;辐射损伤机理;辐射环境下的芯片实时脉冲测试;抗辐射加固;高k介质
2014-01-01到2017-12-31
  • 中英文摘要
  • 结题摘要
  • 结题报告
  • 项目成果
  • 项目参与人
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序号 标题 类型 作者
1 Total Ionizing Dose Response of HfxZr1-xOy Ge MOS Capacitors 会议论文 Yifei Mu;Ce Zhou Zhao;Qifeng Lu;Yanfei Qi;Chun Zhao;Ivona Z. Mitrovic;Stephen Taylor;Paul R. Chalker
2 Hysteresis in Lanthanide Aluminum Oxides Observed by Fast Pulse CV Measurement 期刊论文 Chun Zhao;Ce Zhou Zhao;Qifeng Lu;Xiaoyi Yan;Stephen Taylor;Paul R. Chalker
3 Atomic Layer Deposition of HfO2 Gate Dielectric with Surface Treatments and Post-Metallization Annealing for Germanium MOSFETs 会议论文 Lu Qifeng;Lam Sang;Mu Yifei;Zhao Ce Zhou;Zhao Yinchao;Fang Yuxiao;Yang Li;Taylor Steve;Chalker Paul
4 Effects of biased irradiation on charge trapping in HfO2 dielectric thin films 会议论文 Yifei Mu;Ce Zhou Zhao;Qifeng Lu;Chun Zhao;Yanfei Qi;Sang Lam;Ivona Z. Mitrovic;Stephen Taylor;Paul R. Chalker
5 一种半导体器件γ射线辐射响应的实时在线测试系统 专利 慕轶非;赵策洲
6 Investigation of Anomalous Hysteresis in MOS Devices With ZrO2 Gate Dielectrics 期刊论文 Qifeng Lu;Yanfei Qi;Ce Zhou Zhao;Chenguang Liu;Chun Zhao;Stephen Taylor;Paul R. Chalker
7 Total Dose Effects and Bias Instabilities of (NH4)2S Passivated Ge MOS Capacitors with HfxZr1-xOy Thin Films 期刊论文 Yifei Mu;Yuxiao Fang;Ce Zhou Zhao;Chun Zhao;Qifeng Lu;Yanfei Qi;Ruowei Yi;Li Yang;Ivona Z. Mitrovic;Stephen Taylor;Paul R. Chalker
8 Real-time and on-site c-ray radiation response testing system for semiconductor devices and its applications 期刊论文 Yifei Mu;Ce Zhou Zhao;Yanfei Qi;Sang Lam;Chun Zhao;Qifeng Lu;Yutao Cai;Ivona Z. Mitrovic;Stephen Taylor;Paul R. Chalker
9 Anomalous Capacitance-Voltage Hysteresis in MOS Devices with ZrO2 and HfO2 Dielectrics 会议论文 Qifeng Lu;Yanfei Qi;Ce Zhou Zhao;Chun Zhao;Stephen Taylor;Paul R. Chalker
10 Robust Electrical Characteristics of Multiple-Layer InAs/GaAs Quantum-Dot Diodes Under Gamma Irradiation 会议论文 Yifei Mu;S. Lam;C. Z. Zhao;N. Babazadeh;R. A. Hogg;K. Nishi;K. Takemasa;M. Sugawara
11 Electrical Properties and Interfacial Studies of HfxTi1xO2 High Permittivity Gate Insulators Deposited on Germanium Substrates 期刊论文 Qifeng Lu;Yifei Mu;Joseph W. Roberts;Mohammed Althobaiti;Vinod R. Dhanak;Jingjin Wu;Chun Zhao;Ce Zhou Zhao;Qian Zhang;Li Yang;Ivona Z. Mitrovic;Stephen Taylor;Paul R. Chalker
12 Total Ionizing Dose Response of Hafnium-Oxide Based MOS Devices to Low-Dose-Rate Gamma Ray Radiation Observed by Pulse CV and On-Site Measurements 期刊论文 Yifei Mu;Ce Zhou Zhao;Qifeng Lu;Chun Zhao;Yanfei Qi;Sang Lam;Ivona Z. Mitrovic;Stephen Taylor;Paul R. Chalker
13 Dielectric Relaxation in Lanthanide Doped/Based Oxides Used for High-k Layers 期刊论文 Ce Zhou Zhao;Stephen Taylor;Chun Zhao;Paul R. Chalker
14 Effects of Rapid Thermal Annealing on the Structural, Electrical, and Optical Properties of Zr-Doped ZnO Thin Films Grown by Atomic Layer Deposition 期刊论文 Jingjin Wu;Yinchao Zhao;Ce Zhou Zhao;Li Yang;Qifeng Lu;Qian Zhang;Jeremy Smith;Yongming Zhao
15 Investigation of anomalous capacitance-voltage behavior caused by interface dipoles and the effect of post-metal-annealing 会议论文 Qifeng Lu;Ce Zhou Zhao;Chun Zhao;Steve Taylor;Paul R. Chalker
16 一种PN结瞬时电容能谱测量方法和系统 专利 吴京锦;赵策洲;刘晨光
17 一种PN结瞬时电容能谱测量系统 专利 吴京锦;赵策洲;刘晨光
18 A semi-automated real-time gamma radiation response measurement system for semiconductor device characterisation 会议论文 Mu Yifei;Qi Yanfei;Lam Sang;Zhao Cezhou
19 Capacitance-voltage characteristics measured through pulse technique on high-k dielectric MOS devices 期刊论文 Qifeng Lu;Yanfei Qi;Ce Zhou Zhao;Chun Zhao;Stephen Taylor;Paul R. Chalker
20 Radiation Tolerant DC Characteristics of InAs/GaAs Quantum-Dot Diodes 会议论文 YIfei MU;Sang Lam;Cezhou Zhao
21 Investigation of the Electrical Performance of HfO2 Dielectrics Deposited on Passivated Germanium Substrates 会议论文 Qifeng Lu;Yifei Mu;Yinchao Zhao;C Z Zhao;S Taylor;P R Chalker
22 Review on Non-Volatile Memory with High-k Dielectrics: Flash for Generation Beyond 32 nm 期刊论文 Chun Zhao;Ce Zhou Zhao;Stephen Taylor;Paul R. Chalker
23 一种半导体器件瞬态电容的测试系统 专利 吴京锦;赵策洲;刘晨光
24 一种半导体器件瞬态电容的测试方法和系统 专利 吴京锦;赵策洲;刘晨光
25 Hysteresis in Lanthanide Zirconium Oxides Observed Using a Pulse CV Technique and including the Effect of High Temperature Annealing 期刊论文 Qifeng Lu;Chun Zhao;Yifei Mu;Ce Zhou Zhao;Stephen Taylor;Paul R. Chalker
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