磁场辅助等离子体增强原子层沉积技术中的物理问题研究

11175024
2011
A2907.低温等离子体
陈强
面上项目
教授
北京印刷学院
68万元
原子层沉积;等离子体诊断;薄膜保型性。;磁场辅助
2012-01-01到2015-12-31
  • 中英文摘要
  • 结题摘要
  • 结题报告
  • 项目成果
  • 项目参与人
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序号 标题 类型 作者
1 Insights of Unconventionally Long Exposure Time in Atomic Layer Deposition Al2O3 to Modify SnO2 Photoanode of Dye-Sensitized Solar Cells 期刊论文 Dong Wan, Wang Zhengduo, Yang Lizhen, Meng Tao an|
2 Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition 期刊论文 Lei, Wenwen|Chen, Qiang|
3 The Two Density Peaks in Low Magnetic FieldHelicon Plasma 期刊论文 Y. Wang, G. Zhao, Z. W. Liu, J. T. Ouyang, Q. Chen|
4 染料敏化太阳能电池二氧化锡光阳极表面原子层沉积氧化铝研究 期刊论文 董婉,孟涛,陈强|
5 Comparison of thermal and plasma-enhanced ALD Al2O3 With  different oxidant sources on the sidewall of Si trenches 会议论文
6 The Influence of ALD Al2O3 Process Parameters on Modified SnO2 Photoanode of Dye-Sensitized Solar Cells 会议论文
7 Growth of Copper Films via Plasma Enhanced Atomic Layer Deposition 会议论文
8 Plasma-AssistedALD of Al2O3 Permeation Barrier Layer on Plastics 期刊论文 Lei Wenwen, L iXingcun, Chen Qiang ,Wang Zhengduo|
9 螺旋波等离子体放电特性的射频补偿朗缪尔单探针测量研究 期刊论文 马超, 赵高, 刘忠伟, 桑利军, 陈强|
10 电子回旋共振辅助原子层沉积金属铝薄膜的研究 期刊论文 赵桥桥, 桑利军, 陈强|
11 The influence of substrate temperature on the hydrogenated microcrystalline silicon growth through hollow cathode plasma 期刊论文 Jiuxiang Chen|Shouye Zhang|Jilong Shi|Qiang Chen|
12 氢等离子体辅助原子层沉积铜薄膜的研究 会议论文
13 热原子层沉积与等离子体辅助原子层沉积氧化铝薄膜的比较 会议论文
14 Numerical Simulation of the Sustaining Discharge in Radio Frequency Hollow Cathode Discharge in Argon 期刊论文 Jiang X X, He F, Chen Q, Ge T, J T Ouyang|
15 螺旋波等离子体的发射光谱研究 期刊论文 赵高，马超，刘忠伟，陈强|
16 Area-Selective Atomic Layer Deposition of Al2O3/ZnO Using Self-Assembled Monolayer 会议论文
17 ALD ZnO to Modify ITO for High Efficient Inverted Polymer Solar Cells 会议论文
18 原子层沉积(ALD)技术及其应用 会议论文
19 Insights of Unconventionally Long Exposure Time in Atomic Layer Deposition Al2O3 to Modify SnO2 Photoanode of Dye-Sensitized Solar Cells 期刊论文 Dong Wan, Wang Zhengduo, Yang Lizhen, Meng Tao and|
20 Low-Temperature Atomic Layer Deposition of High Purity, Smooth, LowResistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma 期刊论文 Zheng Guo, Hao Li, Qiang Chen, Lijun Sang,Lizhen Yang|Zhongwei Liu, and Xinwei Wang|
21 Investigation of the remote ECR plasma-assisted atomic layer deposition metal Al thin films 会议论文
22 Performance Of Helicon Plasma Under Two Kinds Of Top Plates 会议论文
23 Performance improvement of inverted organic solar cells by adding ultrathin Al2O3 as an electron selective layer and a plasma enhanced chemical vapor deposition of SiOx encapsulating layer 期刊论文 Lei Qi|Chunmei Zhang|Qiang Chen|
24 The Evolution of Discharge Mode Transition in HeliconPlasma through ICCD Images 期刊论文 Chao Ma, Gao Zhao, Yu Wang, Zhongwei Liu, Lijun Sang, Chen Qi|
25 化学气相沉积/原子层沉积铜前驱体的研究进展 期刊论文 国政，陈强，王正铎，桑利军，杨丽珍，葛新昱，刘忠伟|
26 The Resolution of Mode Transition in Helicon Discharge Through ICCD 期刊论文 C. Ma, G. Zhao, Z.W. Liu, L.J. Sang, Q.Chen|
27 Growth of Copper Films via Plasma Enhanced Atomic Layer Deposition 会议论文
28 Mode transitions of a Helicon Plasma Source in small Magnetic Fields 会议论文
29 Area-Selective Atomic Layer Deposition of Al2O3/ZnO Using Self-Assembled Monolayer 会议论文
30 Growth of Copper Films via Plasma Enhanced Atomic Layer Deposition 会议论文
31 等离子体辅助原子层沉积(PEALD)技术在太阳电池中的应用 会议论文
32 The Role of Atomic Layer Deposited Aluminum Oxide on SnO2 BasedDye-Sensitized Solar Cells PerformanceThe Role of Atomic Layer Deposited Aluminum Oxide on SnO2 BasedDye-Sensitized Solar Cells Performance 期刊论文 Wan Dong, Tao Meng, and Qiang Chen|
33 Dye adsorption on atomic layerdeposited aluminum oxides for tin-oxide-based dye sensitized solar cells 期刊论文 Wan Dong, Lizhen Yang, TaoMeng, Qiang Chen|
34 等离子体辅助原子层沉积氧化铝薄膜的研究 期刊论文 桑利军，赵桥桥，李兴存，雷雯雯，陈强|
35  The ALD ZnO Coating As Inverted Organic Solar Cell Buffer Layer 会议论文
36 热原子层沉积与等离子体辅助原子层沉积氧化铝薄膜的比较 会议论文
37 螺旋波等离子体源放电特性诊断 会议论文
38 Characteristicsand properties of metal aluminum thin ？lms prepared by electron cyclotronresonance plasma-assisted atomic layer deposition technology 期刊论文 Xiong Yuqing, Li Xingcun, Chen Qiang, Lei Wenwen, Zhao Qiao,|
39 Influence of Magnetic Field on the Reaction Mechanisms ofPlasma-Assisted Atomic Layer Deposition of Al2O3 期刊论文 Xingcun Li, Wenwen Lei, Qiao Zhao, Qiang Chen|
40 ElectronCyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3Thin Films 期刊论文 Xiong Yuqing, Sang Lijun , Chen Qiang, Yang Lizhen, Wang Zhen|
41 Nanocrystalline Si:H films made by inductively coupled plasma using internal low inductance antenna 期刊论文 W.C. Wang|X.X. Jiang|J.S. Cherng|Q. Chen|
42 短管螺旋波放电中等离子体参数测量和模式转化研究 期刊论文 赵高,熊玉卿,马超,刘忠伟,陈强|
43 Investigation of the remote ECR plasma-assisted atomic layer deposition metal Al thin films 会议论文
44 The ALD ZnO Coating As Inverted Organic Solar Cell Buffer Layer 会议论文
45 自组装单分子膜为钝化层实现选择性原子层沉积氧化锌的研究 会议论文
46 Plasma Enhanced Atomic Layer Deposition ofCopper Thin Film using [Cu(iPr-amd)]2 as Precursor 会议论文
47 The Study of Low-Field Density Peak in Helicon Plasma 会议论文
48 ALD of Manganese Silicate 会议论文
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