多频等离子体溅射沉积Ag掺杂a-SiCxOy发光材料的研究

11275136
2012
A2907.低温等离子体
叶超
面上项目
研究员
苏州大学
86万元
Ag掺杂;光致发光;非晶SiCxOy薄膜;多频等离子体;溅射
2013-01-01到2016-12-31
  • 中英文摘要
  • 结题摘要
  • 结题报告
  • 项目成果
  • 项目参与人
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序号 标题 类型 作者
1 RF及VHF溅射系统中离子能量分布的实验研究 会议论文 黄福培,叶超,何海杰,刘毅,宁兆元|
2 Plasma property of inductively coupled discharge and substrate bias co-assisted very-high-frequency magnetron sputtering 期刊论文 He Haijie|Wang Xiangying|Ge Shuibing|Huang Fupei|
3 Structure, optical properties and thermal stability of HfErO films deposited by simultaneous RF and VHF magnetron sputtering 期刊论文 Wang Y Y|Zhuge L J|Ye C|Wu X M|
4 Preparation and structural properties of thin carbon films by very-high-frequency magnetron sputtering 期刊论文 Wang, Xiang-Ying|He, Yi-Song|Guo, Jia-Min|Yang, Pei-Fang|
5 Growth of few-layer graphene on SiC at low temperature with the fluorocarbon plasma pre-etching 期刊论文 Ye, Chao|Deng, Yanhong|Chen, Tian|Ge, Shuibing|
6 Control of ions energy distribution in dual-frequency magnetron sputtering discharges 期刊论文 He, Haijie|Huang, Fupei|Liu, Yi|Wang, Xiangying|
7 Structural and electrical properties ofhigh-k HfO2 films modified by CHF3 and C4F8/O2 plasmas 期刊论文 Y. Yang|C. Ye|L. J. Zhuge|X. M. Wu|
8 SiC过渡层制备温度对碳化硅/氟化类金刚石复合薄膜血液相容性的影响 期刊论文 佘清|江美福|钱侬|潘越|
9 Effect of Internal Antenna Coil Power on the Plasma Parameters in 13.56 MHz/60 MHz Dual-Frequency Sputtering 期刊论文 Yang Chicheng|Ye Chao|Ge Shuibing|Ning Zhaoyuan|
10 Effect of Frequency and Power of BiasApplied to Substrate on Plasma Property of Very-high-frequency Magnetron Sputtering 期刊论文 Liu Yi|Ye Chao|He Haijie|Wang Xiangying|
11 Effect of Driving Frequency on Growth and Structure of Silicon Films Deposited by Radio-Frequency and Very-High-Frequency Magnetron Sputtering 期刊论文 Ye, Chao|Wang, Xiangying|Huang, Fupei|Liu, Yi|
12 Reptation Aggregation of Liquid Silicon Oils Modified by Ar Plasmas 期刊论文 Chao Ye|Yanhong Deng, Shuibing Ge, Zhaoyuan Ning|
13 膜厚对AZO:Si薄膜性能的影响 期刊论文 周杨，江美福|
14 Electrical properties improvement of high-k HfO2 films by combination of C4F8 dual-frequency capacitively coupled plasmas treatment with thermal annealing 期刊论文 Yang, Y.|He, H. J.|Zhuge, L. J.|Wu, X. M.|
15 Role of high-frequency power in C4F8 dual-frequency capacitively coupled plasmas treating high-k HfO2 films 期刊论文 Jin, C.G.|Ye, C.|Zhuge, L.J.|Wu, X.M.|
16 Structuralproperties and preparation of Si-rich Si1？xCxthinfilmsby radio-frequency magnetron sputtering 期刊论文 Xiangying Wang|Mingwei Gao|Jiaming Guo|Peifang Yang|
17 Effect of Low-Frequency Power on Etching Characteristics of 6H-SiC in C4F8/Ar Dual-Frequency Capacitively Coupled Plasma 期刊论文 Xu Yijun|Wu Xuemei|Ye Chao|
18 Effect of driving frequency on plasma property in radio frequency and very high frequency magnetron sputtering discharges 期刊论文 He, Haijie|Liu, Yi|Wang, Xiangying|Ning, Zhaoyuan|
19 SiCOH低k介质中低表面粗糙度沟道的刻蚀研究 期刊论文 钱侬|叶超|崔进|
20 Effect of Low-Frequency Power on Etching Characteristics of 6H-SiC in C4F8/Ar Dual-Frequency Capacitively Coupled Plasma 期刊论文 Xu Yijun|Wu Xuemei|Ye Chao|
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