添加剂在单晶硅湿法刻蚀中的作用及刻蚀形貌控制研究
序号 | 标题 | 类型 | 作者 |
---|---|---|---|
1 | TMAH+Triton中Si湿法腐蚀机理研究现状 | 期刊论文 | 姚明秋|苏伟|唐彬|王芳| |
2 | 单晶硅湿法刻蚀形貌控制方法 | 期刊论文 | 姚明秋|唐彬|苏伟| |
3 | Smoothness Control of Wet Etched Si{100} Surfaces in TMAH+Triton | 期刊论文 | Gang Tan|Prem Pal|Kazuo Sato|Wei Su| |
4 | Silicon anisotropic etching in Triton- and IPA-mixed TMAH solution | 期刊论文 | Yao M Q|Tang B|Sato K|Su W| |
5 | Fast Si (100) etching with a smooth surface near the boiling temperature in surfactantmodifiedtetramethylammonium hydroxide solutions | 期刊论文 | Bin Tang|Kazuo Sato|De Zhang|Yongsheng Cheng| |
6 | Process development of an all-silicon capacitive accelerometer with a highly symmetrical spring-mass structure etched in TMAH + Triton-X-100 | 期刊论文 | Shiwei Xi|Guofen Xie|De Zhang|yongsheng Cheng| |
7 | 四川电子科学技术奖 | 奖励 | 唐彬| |
8 | Wet anisotropic etching characteristics of Si{100} in TMAH + Triton near the boiling point | 期刊论文 | Yao M Q|Tang B|Su W|Tan G| |
9 | Fabrication of a symmetrical accelerometer structure | 会议论文 | Kazuo Sato|Guofen Xie|Wei Su|Yongsheng Cheng| |