光刻系统中工作台位移的长行程高精度双色差分干涉测量方法研究
序号 | 标题 | 类型 | 作者 |
---|---|---|---|
1 | Heterodyne period measurement in a scanning beam interference lithography system | 期刊论文 | Shan Jiang;Bo Lü;Ying Song;Zhaowu Liu;Wei Wang;Li Shuo;Bayanheshig |
2 | 一种长行程工作台精密位移分步测量方法和装置 | 专利 | 刘兆武;王玮;李文昊;姜珊;巴音贺希格;李烁 |
3 | Polarization-modulated grating interferometer by conical diffraction | 期刊论文 | Lin Liu;Zhanwu Liu;Shan Jiang;Wei Wang;Hongzhu Yu;Yanxiu Jiang;Wenhao Li |
4 | Grating-based precision measurement system for five-dimensional measurement | 期刊论文 | Qiang Lv;Wei Wang;Zhaowu Liu;Ying Song;Shan Jiang;Lin Liu;Bayanheshig;Wenhao Li |
5 | Active control technology of a diffraction grating wavefront by scanning beam interference lithography | 期刊论文 | Zhaowu Liu;Hang Yang;Yubo Li;Shan Jiang;Wei Wang;Ying Song;Bayanheshig;Wenhao Li |